Method and apparatus for alignment of a line-of-sight communications link

ABSTRACT

Techniques are disclosed for aligning a first optical scope with a second optical scope to achieve a line-of-sight communication link between the two optical scopes. In an example embodiment, each scope can include an optical transceiver and camera. The optical transceiver in the first optical scope can include a light array that is used to emit a bright pulse of light as a flash. The camera in the second optical scope captures this flash in a camera image. The camera image can then be processed to spatially localize the flash relative to a central region of a photodetector array in the optical transceiver of the second optical scope. A control system can then drive a positioning system for the second optical scope to adjust the second optical scope&#39;s positioning so that the second optical scope photodetector array&#39;s central region aligns with the spatially localized flash.

CROSS REFERENCE AND PRIORITY CLAIM TO RELATED PATENT APPLICATION

This patent application claims priority to U.S. provisional patent application Ser. No. 62/554,735, filed Sep. 6, 2017, entitled “Method and Apparatus for Alignment of Line-Of-Sight Communications Link”, the entire disclosure of which is incorporated herein by reference.

INTRODUCTION

The use of free space optical communications (FSOC) for wireless data transfer via light beams relies on a line-of-sight communication link between transmitter and receiver, and such a line-of-sight communication link requires accurate alignment between transmitter and receiver. Failure to properly align the transmitter and receiver can lead to a noisy signal detected by the receiver or even no detection of the signal at the receiver if the misalignment is too great. Achieving accurate alignment can be a challenging task, particularly when there is a long distance between transmitter and receiver.

For example, optical transmitters and receivers in FSOC systems typically employ technicians who manually align the various transmitters and receivers. Since such transmitters and receivers are often located on high towers or in other hard-to-reach places, manual alignment is not only slow and inefficient but can also be dangerous for the technicians.

As a solution to this problem in the art, the inventor discloses a technique for aligning a first optical scope with a second optical scope to achieve a line-of-sight communication link between the two optical scopes.

In an example embodiment, each scope can include an optical transceiver and camera. The optical transceiver in the first optical scope can include a light array that is used to emit a bright pulse of light as a flash. The camera in the second optical scope captures this flash in a camera image. The camera image can then be processed to spatially localize the flash relative to the cross-hairs of the camera, wherein these cross-hairs have a relationship that corresponds to a central region (e.g., a center point) of a photodetector array in the optical transceiver of the second optical scope. A control system can then drive a positioning system for the second optical scope to adjust the positioning of the second optical scope so that the center of the photodetector of the second optical scope aligns with the spatially localized flash.

This process can then be repeated but where the light array in the second optical scope acts as the flash emitter and the camera in the first optical scope captures the image of the flash so that the first optical scope can be controllably positioned so that its photodetector array's central region aligns with the spatially localized flash from the second optical scope.

These alignments can be iteratively repeated until the system determines that the two optical scopes are sufficiently aligned.

In an example embodiment, the same light array used by the aligned first optical scope to emit the flashes used for alignment can also be used by the aligned first optical scope to optically transmit a data signal over the air to the aligned second optical scope with a high signal-to-noise ratio. Similarly, the same light array used by the aligned second optical scope to emit the flashes used for alignment can also be used by the aligned first optical scope to optically transmit a data signal over the air to the aligned first optical scope with a high signal-to-noise ratio.

In this fashion, the optical scopes with such light arrays and alignment capabilities can be used to implement a high-speed wireless data telecommunications system using point-to-point optical communications.

These and other features and advantages of the present invention will be described hereinafter to those having ordinary skill in the art.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1-5 show various views of an example top-emitting implant embodiment.

FIG. 6 shows a view of an example bottom-emitting implant embodiment.

FIGS. 7 and 7A-7C show views of an example top-emitting oxidation embodiment.

FIGS. 8-14 c show various views of an example bottom-emitting oxidation embodiment.

FIG. 15 shows a view of an example microstrip embodiment.

FIG. 16 shows a view of an example phase coherent embodiment.

FIG. 17 shows a view of an example embodiment that employs diffractive optical elements.

FIG. 18 shows a view of an example embodiment that employs pattern diffractive grating.

FIG. 19 shows a view of an example microlens embodiment.

FIG. 20 shows a view of an example tenth embodiment.

FIG. 21 shows a view of an example eleventh embodiment.

FIG. 22 shows a view of an example twelfth embodiment.

FIG. 23 shows an example of an additional pattern for a lasing grid with respect to various embodiments.

FIG. 24 comparatively shows current flow as between an example embodiment designed as described herein and that taught by US Pat App. Pub. 2011/0176567.

FIG. 25 shows an example embodiment of a FSOC system that employs first and second optical scopes for wireless optical data communications with each other.

FIG. 26 shows an example embodiment of an optical scope for use in the system of FIG. 25.

FIG. 27 shows a view of an example light array that can be used by the optical scope of FIG. 25.

FIG. 28 shows an example process flow for alignment of the optical scopes of FIG. 25.

FIGS. 29A and 29B show examples of how camera images can be used to determine the appropriate adjustments to the positioning of an optical scope needed for achieving alignment with the other optical scope.

FIG. 30 shows an example beam splitting arrangement within an optical scope, where a first optical path links to a camera and a second optical path links to an optical transceiver.

FIG. 31 shows a cross-section of the optical axis with a group of laser arrays and a macro-optical element on axis, where a laser array within the larger laser array is flashed and slightly off the optical axis to produce a beam which is directed slightly off axis.

FIG. 32 shows an example position with multiple optical scopes aimed in different directions.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS

FIG. 25 shows an example embodiment of a FSOC system 2500 that comprises first and second optical scopes 2502 for wireless optical data communications with each other. While FIG. 25 shows two optical scopes 2502 in the system 2500, it should be understood that this is only an example for ease of illustration; the FSOC system 2500 may include large numbers of geographically-distributed optical scopes 2502 to create a large scale optical wireless network.

Each optical scope 2502 relies on a line-of-sight communication link with another optical scope 2502 for sending/receiving light beams that carry data. The optical scopes 2502 can be mounted on a support 2506. Examples of suitable supports 2506 will vary based on where the optical scope 2502 is positioned; in some instances structures such as poles, towers, platforms, or roofs may be used as supports 2506. For example, in many urban settings, the poles that are used to elevate street lights may be desirable for placement of optical scopes 2502 as it is expected that the areas near or above streets may be largely occlusion-free for line-of-sight communication links. At the time of set up, each optical scope 2502 can be roughly aligned with each other based on rough location and directional positioning (e.g., via a simple GPS location and pointing which may rely on a proper orientation of the device to a known location such as the north star or other GPS coordinates of a landmark or such). This allows the optical scopes 2502 to be visible to each other, such as via their respective camera's fields of view, to permit subsequent fine-tuned alignment.

Each optical scope 2502 can be adjustably positioned on support 2506 via a positioning system 2504. Such a positioning system 2504 can be configured to controllably change the optical scope 2502's aim in both the vertical and horizontal dimensions, for example via tilt and pan operations that are capable of rotating the optical scope 2502 in any of the x-, y-, and z-dimensions. For example, the positioning system 2504 may take the form of a high resolution motor drive system with gimbal motors that can controllably tilt/pan the optical scope 2502 in a desired manner. In an example embodiment, the gimbals of the positioning system 2504 can have a common system of rotation to use any of 3 axis-xyz type repositioning to adjust the aim of the optical scope 2502. In other example embodiments, the gimbals may only have two axes of rotation, as in an equatorial mount.

When the two optical scopes 2502 are aligned, they can wirelessly communicate optical data 2510 to each other via the line-of-sight communication link. In the example embodiments described in greater detail below, it will be assumed that each optical scope 2502 is capable of bi-directional optical data communication; however, it should be understood that this need not necessarily be the case as a practitioner may desire a uni-directional data flow where one optical scope is configured as a transmitter while the other is configured as a receiver. Furthermore, while FIG. 25 shows a single optical scope 2502 at each geographical position, it should be understood that a practitioner may want to locate multiple, independently-aimed/adjusted optical scopes 2502 at each geographical position so that a given geographical position can maintain potential line-of-sight links with multiple geographical positions. As an example, FIG. 32, which corresponds to FIG. 32C of the above-referenced and incorporated '444 patent application, shows a platform that can support several different optical scopes 2502 aimed in different directions. In this example, the position 3200 includes 7 optical scopes 2502; although it should be understood that more or fewer optical scopes 2502 could be included if desired by a practitioner. Such an arrangement can support the development of an FSOC mesh network.

FIG. 26 shows an example embodiment of an optical scope 2502. The optical scope 2502 can include a camera 2602 and an optical transceiver 2604. The optical transceiver 2604 can include a photodetector array 2606 for data reception and a light array emitter 2608 for data transmission.

The optical scope 2502 can also include optics 2610, where the optics 2610 can take the form of optical elements for delivering incoming or outgoing optical signals to the camera 2602, photodetector array 2606, and light array emitter 2608. The optics 2610 can define a relationship between a field of view for the camera 2602, a field of view for the photodetector array 2606, and a field of view for the light array emitter 2608. For example, it is desirable for the camera 2602, photodetector array 2606 and light array emitter 2608 to share a common field of view via bore sighting. As such, the optics 2610 may include one or more beam splitters. However, a practitioner may also choose to define a known offset relationship between the camera field of view and the photodetector array field of view rather than commonly bore sight the two with each other. In such an example embodiment, the alignment software logic can then take this known offset relationship into consideration when assessing how the optical scope should be re-oriented to achieve a desired alignment. Furthermore, the optics 2610 may include telescoping lenses or the like to provide the optical scope 2502 with an appropriate depth of view.

The optical scope 2502 can also include a control system 2612 that operates to process and relay incoming/outgoing data 2622 to/from a data center or other remote computer system as well as process images from camera 2602 to control alignment operations as discussed below (see control signal 2620 for delivery to the positioning system 2504). The control system 2612 can take the form of one or more processors that are programmed to carry out the operations discussed herein. The control system 2612 may also include a non-transitory computer-readable storage medium such as memory for storing data as well as program instructions. The control system 2612 may also include a wireless RF transceiver that allows it to send and receive wireless RF data from one or more remote computer systems. For example, the control system 2622 can create a local area WiFi network with one or more remote computers to send and receive data. Also, such a wireless RF transceiver and WiFi network could be created by the data center if desired by a practitioner.

When used to receive optical data, the optical scope 2502 can receive incident light 2614 where the incident light 2614 includes an optical beam from the other aligned optical scope 2502 (where this optical beam encodes data), and optics 2610 will direct this optical beam to the photodetector array 2606 (which may include one or more intervening optical filters to filter out light that would qualify as “noise” relative to the wavelengths where the optical data signal is expected). The photodetector array 2606 converts the incident light into a data signal that can be processed as digital data by the control system 2612. This data can be relayed to a data center (see 2622) or perhaps relayed to another optical scope 2502 via the optical transmission capabilities of the optical scope 2502.

When used to transmit optical data, the control system 2612 drives the light array emitter 2608 with an appropriate data signal that causes the light array emitter 2608 to produce beams of light that encode the data. The optics 2610 then direct these beams of light to the other aligned optical scope 2502 for reception and processing thereby.

FIG. 27 shows a view of an example light array emitter 2608. The light array emitter 2608 can include a plurality of laser emitting apertures 2700 formed into an array. While the example of FIG. 27 shows a 5×5 square array of laser emitting apertures 2700, it should be understood that the array can include more laser emitting apertures 2700, and these apertures 2700 can be formed into virtually any desired shape or pattern (e.g., circular arrays, hexagonal arrays, rectangular arrays, etc.).

The laser array emitter 2608 can be a laser-emitting epitaxial structure having a plurality of laser regions within a single mesa structure, each laser region including a laser emitting aperture 2700 that produces a light beam in response to a driving data signal from a connected electrical waveguide. Examples of devices that can be used as such a laser array are disclosed and described in US Pat. App. Pub. 2017/0033535, the entire disclosure of which is incorporated herein by reference and a copy of which is included herewith as Appendix A. Appendix A describes multi-conductive grid-forming laser structures and their connections to a high speed electrical waveguide for high frequency operation. Additional examples of devices that can be used as the laser array emitter 2608 are disclosed and described in the following U.S. patent applications, the entire disclosures of each of which are incorporated herein by reference: (1) U.S. patent application 62/456,476, filed Feb. 2, 2017, and entitled “Methods to Advance Light Grid Structures for Low-Cost Laser Sources”, (2) U.S. patent application 62/456,489, filed Feb. 2, 2017, and entitled “Fabrication of Light Grid Structures with Wafer Scale Processing”, (3) U.S. patent application 62/456,501, filed Feb. 2, 2017, and entitled “High Power Laser Grid Structure for Applications over Distance”, (4) U.S. patent application 62/456,518, filed Feb. 2, 2017, and entitled “Methods for Advancing High Brightness Diodes”, (5) U.S. patent application 62/459,061, filed Feb. 15, 2017, and entitled “Rigid Lasing Grid Structure Array Configured to Scan, Communicate, and Process Materials Using Deformable Light Fields” (6) U.S. patent application Ser. No. 16/011,417, filed Jun. 18, 2018, and entitled “Graphene Lens Structures for Use with Light Engine and Grid Laser Structures”, (7) U.S. patent application Ser. No. 16/102,444, filed Aug. 13, 2018, and entitled “Laser Grid Structures for Wireless High Speed Data Transfers”, and (8) U.S. patent application Ser. No. 16/102,572, filed Aug. 13, 2018, and entitled “High Power Laser Grid Structure”.

Also, the laser array emitter 2608 can be arranged as an array of multiple laser-emitting epitaxial structures, each laser-emitting epitaxial structure having a single mesa structure, where the single mesa structure includes multiple isolated laser regions. In such an array, the laser array emitter 2608 may have multiple mesa structures, where each mesa structure includes multiple isolated laser regions. Such a laser grid structure can exhibit high numbers of laser emitters on a small chip.

FIG. 28 shows an example process flow for alignment of the optical scopes 2502. In an example embodiment, the alignment of optical scopes 2502 achieved by the FIG. 28 process flow can be performed autonomously by the system 2500 without manual intervention by human technicians. Generally speaking, the camera 2602 of the optical scopes 2502 will track and locate high energy flashes of light from the light emitter array 2608 of the other optical scope 2502 and use the location of this flash to adjustably position the optical scope 2502 so that it aligns with the optical scope 2502 that emitted the flash. If necessary, a series of flashes can be emitted so that the optical scope can iteratively zero in on alignment with the other optical scope 2502.

In FIG. 28, the steps on the left side of the frame are performed by a first optical scope 2502 while the steps on the right side of the frame are performed by a second optical scope 2502 to achieve alignment between the first and second optical scopes 2502. The process can begin at step 2800 where the first optical scope 2502 flashes its laser array emitter 2608 at a specified wavelength. This flash can be achieved by driving the laser array emitter 2608 such that many or all of its laser emitting apertures 2700 produce beams that, in the aggregate, form a bright pulse of light with a sufficiently wide divergence angle so that the flash is captured within the field of view of the camera 2602 of the second optical scope 2502. The array can shape the flash as a symmetrical shape (e.g., a circle or similar pattern) so that the second optical scope 2502 can more easily locate a center point of the flash. The flash center point can then be used as the target for alignment. However, the precise center point need not necessarily be used—instead a central region of the flash could be used to achieve sufficient alignment for satisfactory signal-to-noise ratio (SNR). Because the laser array emitters 2608 can provide a wide spread of a high power beam, the power can distributed in the wide beam at the receiver/collector. This results in the SNR being distributed in a more Gaussian beam that can be tolerant to slight misalignments that may arise as between the central region of the flash/beam and the photodetector's central region. The laser array emitter 2608 can produce the flash at step 2800 with a high power level due to a thermal function in the emitter prevents the laser array from overly heating and allows the laser array to perform at peak operating conditions, which may be up to 100× the optical average power of the laser array when used to transmit data. This can arise as a result of an operational artifact of a semiconductor laser or laser array. If the duty cycle is low enough, e.g., typically <1%, the lasers rollover or maximum power out can be increased by 50 to 100 times the average power out. This feature can be used to produce a high optical power flash for a distant or off-optical axis locating signal.

At step 2802, the camera 2602 in the second optical scope 2502 captures a camera image of the flash from step 2800. At step 2804, the control system 2612 can execute logic that filters out wavelengths of light from the camera image other than the known wavelength of the flash. This allows the control system 2612 to easily locate the flash in the pixel space of the camera image. FIG. 29A shows an example camera image 2900 where flash 2902 is present. In an example embodiment, the flash wavelength can be 980 nm. In such an example, the filter could employ narrow band filtering so that wavelengths in the range between around 960 nm to around 1000 nm are passed (while other wavelengths are rejected; such a filter can be referred to as a 980 nm+/−20 nm filter). However, it should be understood that different wavelengths and different bandpass ranges could be employed. Also, in other example embodiments, the filtering could be performed by an optical filter located in any of a number of places in the optical path between the input to the optical scope 2502 and the camera 2602.

At step 2806, the control system 2612 processes the pixels of the camera image 2900 to compute the center point 2904 of the located flash 2902 in the coordinate space of the camera image 2900. However, as noted above, a practitioner may choose to merely locate a central region of the flash 2902 rather than the precise center point. The system can use any frame of reference for this computation, although it is preferred that the frame of reference be at the cross-hairs 2906/central point of the camera image 2900. The cross-hairs 2906 can serve as a proxy for a central region (e.g., the cross-hairs/center point) of the field of view for the photodetector array 2606 that shares the same optical scope 2502 as the subject camera 2602 that produced camera image 2900. For example, with reference to FIG. 30, the optical scope 2502 can commonly bore sight the camera 2602 and optical transceiver 2604 (with photodetector array 2606) via one or more beam splitters 3000 so that the camera 2602 and photodetector array 2606 share a commonly-centered field of view. The beam splitter 3000 can be a dichroic optical system that splits incident light 2614 into two optical paths, with camera 2602 located at one end of a first optical path and the photodetector array 2606 of optical transceiver 2604 located at one end of a second optical path.

At step 2808, the control system 2612 checks whether the computed center point 2904 of flash 2902 is on the cross-hairs 2906. If yes, this indicates that the two optical scopes are largely aligned, and the process flow can jump to step 2820 where the alignment can switch to the other optical scope where the second optical scope 2502 becomes the flash emitter and the first optical scope 2502 becomes the flash receiver. But if step 2808 concludes that the flash center point 2904 does not match up with cross-hairs 2906, then the process flow proceeds to step 2810.

At step 2810, the control system 2612 computes the scope movements needed to place the cross-hairs 2906 onto the flash center point 2904. For example, as shown by FIG. 29A, the control system 2612 can compute the horizontal displacement 2908 and vertical displacement 2910 for the optical scope 2502 needed to move cross-hairs 2906 onto flash center point 2904. At step 2812, these horizontal and vertical displacements can be translated by the control system 2612 into an appropriate control signal 2620 for the positioning system 2504 so that the positioning system 2504 adjusts the gaze of the optical scope 2502 to achieve alignment between the flash center point 2904 and cross-hairs 2906.

After the optical scope 2502 has been adjustably re-oriented at step 2812, the process flow returns to step 2800 where the first optical scope 2502 produces another flash. It should be understood that the aim of the first optical scope 2502 would be held steady for each flash. Also, the first optical scope 2800 can be configured to periodically repeat its flash over intervals that allow for the second optical scope 2502 to have sufficient time to perform steps 2802-2812.

After the second flash, the second optical scope 2502 would re-perform steps 2802-2808 as discussed above. As a result of the re-positioning from the first instance of step 2812, it is expected that the camera image produced as a result of the second instance of step 2802 would appear similar to that shown by FIG. 29B (see camera image 2950 where flash 2952 is largely centered on cross-hairs 2906). In this case, step 2808 may conclude that the cross-hairs 2906 are sufficiently aligned with the second flash's center point so that the process flow proceeds to step 2820. However, if not, further alignments can be performed at steps 2810-2812 and another iteration of flashing at step 2800 can be performed.

From step 2820, the second optical scope 2502 performs a flash operation like that described above for step 2800. Thereafter, the first optical scope 2502 can perform steps 2822-2832 that correspond to steps 2802-2812 described above for the second optical scope 2502.

The system can iteratively repeat these pair-wise alignment operations until the two optical scopes 2502 converge on sufficient alignment with respect to system-defined criteria.

Also, while FIG. 28 shows that one optical scope 2502 repeats steps 2802-2812 until it is aligned with the flash from the other optical scope 2502 before switching which optical scope serves as the flash emitter and which serves as the flash receiver, it should be understood that this switching can be performed after each attempt at alignment so that the optical scopes 2502 switch off after each iteration of steps 2802-2812 (and 2822-2832) on which is the flasher and which is the flashee during the alignment process.

Once aligned via the FIG. 28 process flow, the two optical scopes can then optically send and receive data to each other via beams produced by the laser array emitters 2606 and detected by the photodetector arrays 2608.

In another example embodiment, the laser array emitter 2608 can be arranged to provide non-mechanical alignments. The laser array emitter 2608 can be arranged so that many of the laser emitting regions of the laser array emitter 2608 direct their light beams in slightly offset directions. Different groups of laser regions on the array emitter 2608 can thus define their own directional laser arrays. FIG. 31 shows an example of this, where subarrays 3112 of the laser array emitter 2608 can be aimed in slightly different directions that are off the main optical axis 3110. FIGS. 17-19 and 22, described below in Appendix A, show example embodiments of laser arrays where diffractive optical elements, microlenses, and/or macro-lenses are combined with the laser array structures to achieve light beam outputs that are offset relative to the main optical axis 3110. In the example embodiment of FIG. 31, it is expected that the offsets for the different subarrays 3112 relative to the main optical axis 3110 will be very slight, but sufficient to define a desired overlapping scope of coverage by the light beams from the light array emitter 2608. With such an arrangement, if the two optical scopes 2502 are roughly aligned with each other, further fine-tuned alignment may be achieved non-mechanically by sequencing through a flashing of each subarray 3112 to find if any of the subarrays 3112 are closely aligned with the photodetector array of the other optical scope 2502. The receiving optical scope 2502 can check whether any of the sequenced flashes from the different subarrays 3112 are largely centered on the camera cross-hairs 2906. If so, the subarray 3112 that produced the aligned flash can be tagged as the aligned subarray 3112 of laser array emitter 2608 and then used for optical data transmissions to the other optical scope 2502 without the need for further mechanical re-positioning of the optical scope 2502 via positioning system 2504.

Such an arrangement as shown by FIG. 31 could thus be employed in an example embodiment to achieve final fine-tuned alignment of optical scopes after an initial rough alignment via mechanical repositioning via positioning system 2504. Further still, in another example embodiment, if the scope of coverage by the different subarrays 3112 is sufficiently wide and dense (e.g., overlapping), the system could permit optical alignment without the need for any mechanical re-positioning. In such an embodiment, a practitioner may thus choose to omit the positioning system 2504 entirely and instead rely on sequencing through the different subarrays 3112 to find which of the subarrays 3112 is best aligned with the other optical scope.

While the present invention has been described above in relation to example embodiments, various modifications may be made thereto that still fall within the invention's scope, as would be recognized by those of ordinary skill in the art. Such modifications to the invention will be recognizable upon review of the teachings herein. As such, the full scope of the present invention is to be defined solely by the appended claims and their legal equivalents.

Appendix A—US Pat App Pub 2017/0033535

Laser arrays are becoming important in the field of communications, light detection and ranging (LiDaR), and materials processing because of their higher operational optical power and high frequency operation as compared to single lasers, fiber lasers, diode pumped solid state (DPSS) lasers, and light emitting diodes (LEDs).

Laser arrays are commonly used in printing and communications, but in configurations which have a single separate connection to each laser device in the array for parallel communication where each laser could have a separate signal because it had a separate contact from the other devices in the array.

When array elements were tied together and driven with a single signal, the structures had too much capacitance or inductance. This high capacitance/inductance characteristic slowed the frequency response for the laser array down, thereby making such laser arrays slower as they added more elements. This is evidenced in the referenced works by Yoshikawa et al., “High Power VCSEL Devices for Free Space Optical Communications”, Proc. of Electronic Components and Technology Conference, 2005, pp. 1353-58 Vol. 2, and U.S. Pat. No. 5,978,408.

High speed laser arrays based on multi-mesa structures are described in the inventor's previous work, US Pat App. Pub. 2011/0176567. US Pat App. Pub. 2011/0176567 describes a multi-mesa array of semiconductor lasers and their connections to a high speed electrical waveguide for high frequency operation. However, the multi-mesa structures described in US Pat App. Pub. 2011/0176567 suffers from a number of shortcomings.

One problem with mesa structures as described in US Pat App. Pub. 2011/0176567 is they are typically brittle. This is a problem if there is any mechanical procedure to bond to or touch the laser after the mesa is formed. The mesas structures can be as small as 5 to 10 microns in diameter and consist of an extremely fragile material such as GaAs or AlGas, or other similar crystalline materials. These mesas must be bonded after processing and pressure is applied under heat so that the submount and the tops of the laser mesas are bonded electrically with solder. When bonding an array of back emitting devices a typical failure mechanism at bonding is a cracked mesa which renders the laser useless and can cause a rejection of the entire device. If there are 30 lasers on the chip and after bonding 2 are broken, those 2 devices will not light up. The testing still must be done causing an expensive process to remove failures.

Another problem is that the multi-mesa structure yields relatively low lasing power as a function of chip real estate because of spacing requirements for the multiple mesas that are present on the laser chip.

Another problem with the multiple mesa arrays produced by mesa isolation is that the lasers are separated by a distance which limits the overall size of the array due to frequency response-dependent design parameters that prefer shorter distance for a signal to travel across a contact pad. Later, arrays were used with elements which add in power such as the multi Vertical Cavity Surface Emitting Laser (VCSEL) arrays which were used for infrared (IR) illumination. However these IR sources did not support high frequency operation, so their pulse width was limited to illumination instead of LIDAR, which needs fast pulse widths.

In an effort to satisfy needs in the art for stronger and more powerful high speed laser arrays, the inventor discloses a number of inventive embodiments herein. For example, embodiments of the invention described below incorporate a high frequency electrical waveguide to connect lasers of the array together while reducing capacitance by forming the signal pad on the substrate which employs the electrical waveguide. Embodiments of the invention also comprise the use of multi-conductive current confinement techniques in a single structure to produce multiple areas that are conducting compared to non-conducting part of the structures. The conducting parts form lasing areas or grids of lasing forming lasers without etching around the entire structure of the lasing point. Unlike the design described in the above-referenced U.S. Pat. No. 5,978,408, embodiments of the invention disclosed herein are designed and processed so that the laser array is integrated with a high speed electrical waveguide to enable high frequency operation. Embodiments of the present invention support new and unique opportunities in the design of a high power high speed light sources by exhibiting both high frequency operation and a rigid structure, thus enhancing performance and reliability over other designs known in the art.

In an example embodiment disclosed herein, a unique structure processed from a Vertical Cavity Surface Emitting Laser (VCSEL) epitaxial material forms a grid of laser points from a single rigid structure which is conducive to high speed operation by reducing capacitance, increasing structural integrity, and decreasing the fill factor as compared to the typical mesa structures formed in VCSEL arrays such as those mentioned in US Pat App. Pub. 2011/0176567. It should be understood that the VCSEL embodiment is only an example, and such a design can work with other laser types, such as Resonant Cavity Light Emitting Diodes (RCLEDs), LEDs, or Vertical Extended (or External) Cavity Surface Emitting Lasers (VECSELs).

The single contiguous structure described herein forms areas of electrical isolation of apertures using implanting of ions or areas of nonconductive oxidation through microstructures or holes while keeping the structural integrity of the material that is typically etched away. The formation of the new structure also allows a high speed signal to be distributed between the different isolated laser conduction points or grid. All of the P-contact areas of the laser grid can be connected in parallel to the signal portion of a ground-signal-ground (GSG) integrated electrical waveguide. The signal or current being switched on and off in the waveguide is distributed between all of the conductive paths which form lasers. It should be understood that other types of electrical waveguides could be used such as a micro-strip waveguide.

The single contiguous structure has other benefits such as a larger base for heat distribution within a larger plating structure. The lasing grid is closer together than the array structures to each other. The farther the lasers are apart the slower the frequency response or the speed which limits the ultimate bandwidth of the device due to the distance the signal must travel to every single point in an array.

Accordingly, examples of advantages that arise from embodiments of the invention include:

1. Rigid structure has a higher reliability in the chip bonding process

2. Rigid structure has a higher fill factor possibility

3. Rigid structure has higher reliability metal contacts

4. Rigid structure is simpler to process

5. Rigid structure has shorter distance between contacts enabling higher frequency high power beams

6. Rigid structure is a better surface topology for a single lens or lens array to be attached

7. Rigid mesa structure produces another area for leads and contacts which offer separation from potentials lowering capacitance.

8. Rigid structures allow higher integration with sub mounts because of the 3D nature of the contacts.

Furthermore, with an example embodiment, a laser grid is formed by more than one lasing area enabled by confining the current to isolated regions in the structure where conductivity exists as compared to the nonconductive ion implanted areas. The conductive and nonconductive areas form a grid of light which has a single metal contact on the single solid structure for the active Positive contact and a single N Contact on the surrounding ground structure which is shorted to the N contact area at the bottom of the trench isolating the two areas. By way of example, FIG. 7C shows how an opening in the frame would help increase the speed.

These P and N contacts are then bonded to a high speed electrical contact The 2 substrate and laser chips are aligned by a bonder then heat and pressure are applied to bond the solder that has been deposited on one chip or the other. The high speed is enabled because the p pad is separated from the n wafer ground by plating and solder heights but mostly by removing it off the laser substrate and placing it on an electrical waveguide substrate. The physical separations dramatically reduces capacitance increasing the frequency response which is limited by the capacitance of the circuit. This enables the lasing grid to achieve high frequency operation.

A single lens formed on the back of the substrate or a single Lens attached or bonded to the back of the grid structure could direct each lasing point from a convergence point or to a convergence point. This is ideal in collimating the beam output as if it were from a single source.

These and other features and advantages of the present invention will be described hereinafter to those having ordinary skill in the art.

Embodiment 1 for US Pat App Pub 2017/0033535—Top-Emitting Implant

FIG. 1 shows an example of a first embodiment of the invention. In this example, a single solid structure is isolated from a surrounding ground with an etch, and where the single solid structure has within it ion implants. The ion implants create areas of the semiconductor material that are non-conductive, and these areas of non-conductivity force current flow through the lasing areas 2. Thus, the ion implants form a laser grid of multiple lasing areas 2 where current is confined to isolated regions in the structure where conductivity exists as compared to the nonconductive ion-implanted areas. The conductive and nonconductive areas form a grid of light which has a single metal contact on the single solid structure for the active positive (P) contact and a single negative (N) contact on the surrounding ground structure which is shorted to the N contact area at the bottom of the trench isolating the two areas or to negative metal on the surrounding ground structure which is shorted to the N contact area at the bottom of the trench isolating the two areas (as in, for example, FIG. 7C (see reference numbers 781 and 782). These P and N contacts are then bonded to a high speed electrical contact, thereby enabling the lasing grid to achieve high frequency operation.

While FIG. 1 shows the lasing areas 2 arranged in a grid pattern, it should be understood that many shapes and patterns of lasing areas 2 could be formed. This allows many forms of structures with shapes/patterns of lasing areas 2 such as a honeycomb structure pattern (see, for example, FIG. 23 which illustrates another pattern which is one of many allowing different laser shapes or patterns; there are many patterns that can be used for etching or implanting to leave conductive areas 41 for lasers in a single mesa structure versus non-conductive areas 42) and other structure patterns which are more rigid while improving bonding. Heat removal can still be accomplished by depositing materials with high thermal conductivity materials in the holes that are etched into the single mesa structure to produce the multiple lasers (see, e.g., holes 7005 in FIG. 7) which are closer to the junctions. Examples of additional structure patterns can include arrangements like squares or circles on lines, etc.

FIG. 1 shows a top view of the epitaxial side of a laser chip. A single laser-emitting epitaxial structure 1 has an ion-implanted area, all except the lasing areas 2 (which are shown as disks in FIG. 1) where the ion implant was masked. FIG. 1 thus represents the chip after implant, and etch. Relative to the prior design of US Pat App Pub 2011/0176567 which has multiple epitaxial mesas with each mesa corresponding to a single lasing region, the design of FIG. 1 shows a single contiguous structure 1 that does not have multiple mesas and can instead be characterized as a single mesa, where this single mesa includes multiple lasing regions 2. The illustration of FIG. 1 is meant to show the single mesa structure and not the electrical contacts. This structure 1 could be either bottom emitting or top emitting depending on the design and reflectance on the N mirror as compared to the P mirror.

FIG. 1 shows:

-   -   1 Single Active Mesa Structure which will produce multiple         lasing points     -   2 Areas where implant is masked so that implant does not affect         epitaxial region under mask.     -   3 Etched isolation trench separating the Single Active Mesa         Structure and the Single Ground Structure     -   4 Single Ground Structure

FIG. 2 is a cutaway view of the laser chip shown by FIG. 1, where the single active mesa structure 1 shown by FIG. 1 is numbered as 11 in FIG. 2 and where the masked implant areas 2 shown by FIG. 1 are numbered as 12 in FIG. 2. FIG. 2 represents the chip after implant, and etch but no top metal. Etched region 13 isolates the single mesa structure 12 from the “frame” or N mesa 14 (where the single ground structure 4 from FIG. 1 is shown as the frame/N mesa 14 in FIG. 2). FIG. 2 shows:

-   -   11 Implanted area of Single Active Mesa Structure isolating         multiple lasing points     -   12 Areas of the Epitaxy Masked from Implant which will produce         lasing     -   13 Etched isolation trench separating the Single Active Mesa         Structure 11 and the Single Ground Structure 14     -   14 Single Ground Structure     -   15 Quantum wells between the top P mirror and the bottom N         mirror—this is an active region where Photons are emitted     -   16 N mirror which has N contact layer or highly doped layers for         N metal electrical contact location     -   17 Laser substrate

FIG. 3 is a perspective view of the chip shown by FIGS. 1 and 2. The implanted region is invisible. The metal contacts are not shown. This illustration is to show the topology of the single mesa etch, which can be used for either top-emitting or bottom-emitting implanted devices. The process of implant can take place before or after top metal or etch.

FIG. 4 shows a top view of the epitaxial side of an example top emitting VCSEL grid structure. The view is through a square hole in the top electrical waveguide which is bonded by a solder process to the laser chip. The isolation etched region is hidden in this view by the electrical waveguide. The round disks on this illustration are the holes in the top metal contact or plated metal contact region over the single solid mesa structure. FIG. 4 shows:

-   -   41 Hole in substrate with waveguide underneath     -   42 Holes in the top P metal so laser beams can emit through     -   43 Top of waveguide substrate     -   44 Top spreading metal on laser chip

FIG. 5 illustrates a cutaway view of the bonded electrical waveguide and laser chip shown by FIG. 4. The signal contact for the electrical waveguide is opened to allow the beams to propagate through the opening. Another option of this embodiment would be to have a transparent or transmitting substrate material for the waveguide instead of a hole for the lasers to propagate through. A transparent material such as CVD (Chemical Vapor Deposited) diamond or sapphire or glass could be an example of that material. This figure shows the embodiment with a substrate such as AlNi which is opaque and thus needs a hole or opening. Notice the isolation region is separating the single mesa structure from the single mesa ground or structure or “frame” structure which is shorted to ground.

These P and N contacts are bonded to a high speed electrical contact (see also FIG. 7B, reference numbers 751 through 754). The ground-signal-ground (GSG) electrical waveguide substrate and laser chips are aligned (see FIG. 14B) so that the negative mesa is bonded to the negative part of the waveguide and the positive active areas which lase are aligned to the signal pad. This alignment is defined by a bonder, then heat and pressure are applied to bond the solder that has been deposited on one chip or the other (see FIG. 15) The high speed nature of this contact arises because the p pad is separated from the n wafer ground by plating and solder heights but mostly by removing it off the laser substrate and placing it on an electrical waveguide substrate. The physical separations dramatically reduce capacitance, thereby increasing the frequency response (where the frequency response is limited by the capacitance of the circuit) and yielding high frequency operation for the lasing grid.

In an example embodiment, for high speed operation, the surface connects to the electrical contact at the bottom of epi design, which is accomplished through the isolation trench (see, for example, FIG. 7A reference number 702) surrounding the single structure (see, for example, FIG. 7A (reference number 717)). This structure is not based on mesa topology but is simply shorted to the electrical region of the N contact metal (see FIG. 7A (reference number 703)) through the metal plating (such as in FIG. 7C reference number 782). This is not a built up structure or raised structure as described in US Pat App. Pub. 2011/0176567 but rather uses the chip surface and the epi material to be a surface for bonding, which also makes the device much more stable and robust at bonding.

Returning to FIG. 5, the GSG Signal Pad 51 has Solder 52 electrical connecting the P Contact Metal on the top of the Active Single Mesa Structure. This allows the signal or current to be injected into the metal contact structure with holes in it for laser propagation and then the current flows through the non-implanted regions of the epitaxial structures forcing current to be confined to just those defined regions. The top P mirror region has a slightly lower reflectance than the bottom N mirror allowing the light to emit from the top of the epitaxial structure. The current flows on through the quantum wells which produce the light and heat in there junction, and into the n mirror where it proceeds to the N contact region in or near the n mirror. The current would then proceed up the shorted frame structure which is bonded and in electrical contact to the ground portion of the GSG electrical waveguide. This structure which utilizes top emitting design can be used for lower wavelength output designs which are lower than the transmission cutoff of the GaAs or laser substrate material. Back emitting structures can typically only be designed for wavelengths above ˜905 nm. This top emitting structure could be used with ˜850 nm or lower to the limits of the epitaxial material set.

A single solid structure isolated from a surrounding ground with an etch where the single solid structure has within it ion implants; the implants are invisible but cause the semiconductor material to be nonconductive because of the crystal damage it causes. In order to make an implanted device you must mask the areas that are to be protected from the damage first.

Small mesas are formed with photoresist positioned by a photolithographic process which protects the epitaxial material from damage then is washed off after the implant takes place. The implant happens in an ion implant machine which accelerates ions down a tube and you put the wafer in front of the stream of ions.

Implanted ions can create areas of the semiconductor material that are non-conductive. These areas of non-conductive material will force the current flow through the lase areas. These non-conductive areas can also be created by etching a pattern similar to FIG. 1 and oxidizing the single structure as described below in connection with Embodiment 2. FIG. 5 shows:

-   -   50 Non Conducting Electrical Waveguide Substrate     -   51 Signal metal of electrical waveguide     -   52 Solder metal for bonding electrical waveguide to laser chip     -   53 Plated Metal shorted to P Contact Layer and electrically         connected to Signal pad of GSG electrical waveguide     -   54 P Output Mirror-Diffractive Bragg Reflector     -   55 Active Region-Quantum Wells     -   56 N Mirror where low resistance contact Layer is located     -   57 Plated Metal shorting or in electrical contact with N Contact         layer and to Ground Mesas     -   58 Solder in Electrical contact with Ground pad of electrical         high speed waveguide and in electrical contact with Grounded         Mesa structure     -   59 Area on Plated metal connected to P Metal on single mesa         structure for contacting signal pad on high speed electrical         waveguide

FIG. 24 shows a comparative view of different current flows as between an embodiment such as Embodiment 1 and the design taught by US Pat App. Pub. 2011/0176567. With US Pat App. Pub. 2011/0176567, each mesa is surrounded by an N metal contact area. This takes precious space or real estate on the chip as the processing to define those footstep metal n contacts around each mesa require photolithography which limits how closely you can space the mesas together. These limits lead to a lower power output per unit area than the new method. Therefore the goal of this old apparatus was an array for highest power and speed yet did not take into account the vast improvement in power/area which would also be an improvement in the ultimate goal of highest Power with the highest Speed. Also, this old method's N contact had to be large because of the structural limitations from the old method has been removed with the new single structure.

With the new design described herein, a single structure has several lasers on it and only one contact around that single structure. The new structure reduces that N metal area to the outside of the structure making the area per light element much smaller. This involves a large N contact layer calculated to carry the current load of the single structure. The higher current flow from the single contact can be realized through thicker metal and or thicker N contact region.

Embodiment 2 for US Pat App Pub 2017/0033535—Bottom-Emitting Implant

FIG. 6 illustrates a cutaway view of an example of a second embodiment, where the second embodiment is a bottom-emitting device with implanted regions for current confinement. The GSG electrical waveguide can be seen solder bonded to the frame-ground structure and the active single laser mesa structure. FIG. 6 shows:

-   -   601 Electrical Waveguide Substrate     -   602 Ground Contact and Signal Contact in that order of GSG         Electrical Waveguide     -   603 Solder-Bonding GSG Waveguide to Laser Chip     -   604 Plating Metal electrically connecting Signal pad of         Electrical Waveguide to Lasers P contact     -   605 P contact Metal     -   606 Implanted Region that has been rendered non conductive     -   607 P mirror     -   608 Active region (quantum wells)     -   609 N Mirror     -   610 Conducting Layers in N Mirror where Implant has not reached     -   611 Laser Beams Propagating through Laser Substrate     -   612 Plating Metal shorted to N contact region     -   613 Frame Area Shorted to N Contact region     -   614 Solder electrically contacting N contact on Laser to Ground         on Electrical Waveguide     -   615 Etched region isolating large single mesa from Ground Frame

Process for Embodiments 1 and 2 of US Pat App Pub 2017/0033535

An example embodiment of the process steps to create the single structure for embodiments 1 and 2 with implant current confinement can be as follows.

-   -   Step 1. Use photolithography to mask areas which will not have P         Metal deposited.     -   Step 2. Deposit P Metal (typically TiPtAu ˜2000 A)     -   Step 3. Photolithography lift off and wafer cleaning. O2 descum         or ash all organics off wafer.     -   Step 4. Dielectric deposit (typically SiNx ˜<1000 A) used as an         etch mask     -   Step 5. Photolithographic masking using either photoresist or         metal deposited in areas to protect the epi material from being         damaged from the implant which makes the unprotected regions         non-conductive through ion bombardment. This step can be         performed later in the process but may be more difficult due to         more varied topology.     -   Step 6. Implant—Those skilled in the art of calculating the         implant doses will determine the dose and species of implant         needed to disrupt the materials structures to the depth which         will isolate the p regions and the quantum wells from each         other—     -   Step 7 Cleaning this photolithography is difficult due to the         implant and a deposition of metal over the photolithography such         as plating could help to make it easier to clean off the resist.     -   Step 8. Use photolithography to mask areas of dielectric which         will not be etched. This is the unique part which is the design         of the mask which creates a large isolated structure down         implants within that structure define where current cannot flow.     -   Step 9. Use plasma etch to etch through dielectric (typically Fl         based etchant) can use wet etch such as BOE (buffered oxide         etch).     -   Step 10. Etch pattern into Laser or Light Emitting Diode         Epitaxial material. Stop on Substrate or doped electrical         contact layer. This isolates a single large structure from the N         shorted regions around the chip     -   Step 11. Clean off mask. O2 descum or ash all organics off         wafer.     -   Step 12. Use photolithography to mask areas which will not have         N Metal deposited.     -   Step 13. Deposit N Metal (Typically GeAu/Ni/Au eutectic         composition of 80% Au/20% Ge by atomic weight. Total thickness         of AuGe layer ˜3000 A or more with ˜200 A Ni or more of other         diffusion barrier metal and ˜5000 A of Au or more This is also         unique hear where the n metal is deposited in the n contact         etched region and also up and over the N contact structure         shorting the structure to the n-contact.     -   Step 14. Clean off mask (typically called lift off). O2 descum         or ash all organics off wafer.     -   Step 15. Dielectric deposit (typically SiNx ˜2000 A) used as a         non-conductive isolation barrier     -   Step 16. Use photolithography to mask areas of dielectric which         will not be etched.     -   Step 17. Use plasma etch to etch through dielectric (typically         F1 based etchant) can use wet etch such as BOE (buffered oxide         etch).     -   Step 18. Clean off mask. O2 descum or ash all organics off         wafer.     -   Step 19. Use photolithography to mask areas which will not have         Plated Metal deposited.     -   Step 20. Plate areas with ˜4-5 um of Metal (typically Au) or Cu         if diffusion barrier can be deposited first.     -   Step 21. Use photolithography to mask areas which will not have         Solder deposited.     -   Step 22. Deposit Solder Metal (Typically AuSn/Au eutectic         composition of 80% Au/20% Sn by atomic weight. Total thickness         of AuSn layer ˜40000 A (4 microns) or more with ˜500 A Au on top         to stop any oxidation of Sn. This layer can be patterned and         deposited on the submount with electrical waveguide which is         bonded to the laser grid.

Embodiment 3 for US Pat App Pub 2017/0033535—Top-Emitting Oxidation

In a third embodiment, oxidation rather than ion implantation is used to create the grid of top-emitting lasing regions within the single structure. For example, a patterned etch can isolate conductive paths in a single structure, creating a grid of light sources. This structure exhibits multiple laser emission points from the single structure. The lasing structure is isolated with an etched region from the ground contact that forms the outside perimeter of the chip. This structure for Embodiment 3 is top emitting. The conductive areas of the grid are where light will be emitted. The positive electrical contact can be a grid with openings where the light is emitted.

The epitaxial material of the laser wafer can be a VCSEL design, and most VCSELs are top emitting. The distribution of the signal using a p type waveguide pad is typically on the laser wafer, but it should be understood that in an oxidated single structure embodiment that has a back emitting design, the waveguide can be on a separate substrate that is separated from the laser n material or layer.

FIG. 7, which shows an example of Embodiment 3, illustrates an example pattern etched into a wafer to create a single structure which allows multiple point lasing. The single structure of an embodiment such as that shown by FIG. 7 is much more rigid than the thin columns made of fragile crystal material as taught by US Pat App. Pub. 2011/0176567. Also, as explained with respect to an embodiment discussed above, it should be understood that pattern of lasing areas other than that shown by FIG. 7 may be employed if desired by a practitioner.

In FIG. 7, the diagonally striped areas are preferably etched down to create the patterned single mesa structure in the middle of the isolation trench. All diagonally striped areas are preferably etched down to the bottom N electrically conductive layer 705 in FIG. 7A or typically the larger isolation trench will be etched to the electrical contact buried in the epitaxial design, while the smaller patterned etch areas must go deeper than the active region which isolates the lasing points. The patterned structure in the middle of the isolation trench is a single structure with “shaped” holes etched into it.

The holes in the large single mesa are large in this case. These holes allow the oxidation process environment to oxidize the layers in the epitaxial region. The oxide layer or layers has high aluminum content and forms AlO₂ that grows laterally through the layer until taken out of the oxidation process. White areas are the surface of the chip, dotted lines are where oxidation limits current flow to unoxidized areas only. The holes in the large single mesa are large in this case. These holes allow the oxidation process environment to oxidize the layers in the epitaxial region. The oxidation layer can be formed by using a high Al content layer in the epi design structure which is buried below the surface. The etched areas expose that layer which is then placed in an oxidation chamber allowing the exposed layer to oxidize inward, where AlO₂ grows laterally through the layer until taken out of the oxidation process. As the length of the oxidation grows in that thin layer, it isolates or closes off the current paths with a dielectric material of AlO₂ that is formed during the oxidation process. If the areas 7005 are etched, then the oxidation will continue to grow until only areas 7008 are conductive and the area or part of the epitaxial layers which conduct the current through that section. Electrically conductive areas allow current flow through the quantum wells (see FIG. 7A reference number 707) and produce lasing as the light is trapped in the cavity between the p mirror 709 and N mirror 706.

The oxidation length can be seen in FIG. 7 as dotted lines, all about the same distance from any one exposed edge or holes in the large single structure that has holes formed in it. FIG. 7 also shows the large single mesa ground structure. Three views of cross sections are illustrated to identify where FIGS. 7A, 7B, and 7C are located. Note 7B which clearly shows through this cross section that the mesa in the center is a single structure.

FIG. 7 shows:

-   -   7001 Frame (Single Shorted Mesa) for Electrical Contact to         Ground of Electrical Waveguide     -   7002 Etched region isolating large single mesa from Ground Frame     -   7003 Single Mesa Structure with Etched Holes     -   7004 Indents in Edges to keep edges of Single Mesa Structure         Oxidized and Non Conductive     -   7005 Etched Hole in Single Mesa Structure     -   7006 Oxidation Pattern around any Etched Edges     -   7007 Overlapped Oxidized Areas not allowing Current Flow     -   7008 Laser Aperture where Current Flows freely (same as 761 in         FIG. 7B)     -   7009 Gap in Shorted Mesa Structure to Reduce Capacitance from         Ground to Signal Pad on Electrical Waveguide

FIGS. 7A, 7A2 and 7B are side views of the example FIG. 7 embodiment.

FIG. 7A2 shows the etched holes 727 that allow the oxidation 731 to form, which confines the current into region 761 of FIG. 7B, for formation of laser beams 763.

Reference number 706 in FIG. 7A is a p mirror diffractive Bragg reflector (DBR) which has one or more layers in it with very high aluminum content 708 which when exposed to hot damp conditions oxidizes 708 confining the current to the areas 761 shown by FIG. 7B, which are where the laser beams come out. The N mirror DBR 709 has a conductive layer 705 to take the current flow out through the N metal ohmic contact 703 to the plating 782 (see FIG. 7C) which goes up and over the single ground mesa structure 718 (see FIG. 7A) to the solder 717 and electrically connecting to the N plating on the GSG waveguide 716 and into the N contact 715 of the waveguide.

Current confinement is a major part of a semiconductor laser. The concept is to force the current flow away from the edges of the structure so there is not an issue with current flowing near rough surface states that may exist from the etch. The current flow is also ideally concentrated to create lasing by increasing the current density in the material The current confinement occurs either by oxidation through allowing the high concentrate layers of Al to get exposed by hot damp conditions in the oxidation process enabled by the drilled holes (e.g., this Embodiment 3), or by the implant to render all other areas nonconductive (e.g., see Embodiments 1 and 2).

FIG. 7A shows:

-   -   701 Electrical Waveguide Substrate     -   702 Etched region isolating large single mesa from Ground Frame     -   703 N Metal contact electrically contacting N contact layer     -   704 N Mirror     -   705 N Contact layer in N mirror (low resistance for ohmic         contact)     -   706 N Mirror above N contact region     -   707 Active region (quantum wells)     -   708 Oxidized Layer Closing off Current in these Regions     -   709 P mirror     -   710 Dielectric Layer     -   711 Plating on top of P contact Metal     -   712 Aperture in P Contact Metal and Plating Metal for laser beam         exit     -   713 Electrical Waveguide Substrate     -   714 Ground Contact of GSG Electrical Waveguide     -   715 Signal Contact of GSG Electrical Waveguide     -   716 Solder-Bonding GSG Waveguide to Laser Chip     -   717 Solder-Bonding GSG Waveguide to Laser Chip     -   718 Frame structure electrically connected to N contact region         of laser chip

FIG. 7A2 is a continuation of FIG. 7A above, and it further shows:

-   -   721 Ground Contact of GSG Electrical Waveguide     -   722 Plating on Ground Contact of GSG Electrical Waveguide     -   723 Solder-Bonding GSG Waveguide to Laser Chip     -   724 Signal Contact of GSG Electrical Waveguide     -   725 Solder-Bonding GSG Waveguide to Laser Chip     -   726 Plating on Signal Contact of GSG Electrical Waveguide     -   727 Etched Hole Regions in Single Mesa Substrate permits         oxidation to form Current Confinement Apertures     -   728 Plating on top of P contact Metal     -   729 Opening in Dielectric layer for electrical contact from         Plating to P Contact Layer on Laser Single Mesa Structure     -   730 Dielectric Layer     -   731 Oxidation Layer closing off current near Etched Hole Regions

FIG. 7B is a FIG. 7 cutaway view that also shows the electrical connections and electrical waveguide that are not shown in FIG. 7. FIG. 7B illustrates the cross section through the apertures created by the oxidized layer. The oxidized layer is exposed to the oxidation process through the holes in the single structure illustrated in FIG. 7A. This view also shows that the Active Mesa Structure is truly a Single Mesa Structure. FIG. 7B depicts:

-   -   751 Ground Contact of GSG Electrical Waveguide     -   752 Plating on Ground Contact of GSG Electrical Waveguide     -   753 Solder-Bonding Ground of GSG Waveguide to Laser Chip     -   754 Signal Contact of GSG Electrical Waveguide     -   755 Plating on Signal Contact of GSG Electrical Waveguide     -   756 P contact Metal on Laser Chip     -   757 Opening in plating and P Contact Metal over Laser Aperture     -   758 Plating on P Contact Metal     -   759 Solder-Bonding Signal of GSG Waveguide to Laser Chip     -   760 Dielectric Layer Protecting Active Mesa Structure from N         Contact     -   761 Current Confinement Aperture formed by opening in Oxidation         Layer     -   762 Oxidation Layer Dielectric     -   763 Laser Beam Propagating through Metal Opening

FIG. 7C is a cross sectional view of the area where the P Contact or Signal of the GSG waveguide is positioned below the Laser Chip where the N Contact Frame or single structure mesa grounded to the N contact of the laser is above the GSG Electrical Waveguide. The large gap between the Laser Ground and the P Signal Pad reduces the capacitance of the circuit enabling higher frequency operation. FIG. 7C depicts:

-   -   780 Dielectric Layer     -   781 N Type Ohmic Contact Metal     -   782 Plating Shorting N Metal Contact to Single Ground Mesa         Structure     -   784 N Contact Layer in Epitaxial Growth     -   785 Plating Electrically Contacted to Signal Pad on Electrical         Waveguide     -   786 Metal Signal Pad Lead on GSG Electrical Waveguide     -   787 Plating on Ground Pad of GSG Electrical Waveguide     -   788 Electrical Waveguide Substrate     -   789 Gap between Conductive Signal Pad Structure and N Contact         Layer Reduces Capacitance

Process for Embodiment 3 of US Pat App Pub 2017/0033535

An example embodiment of the process steps to create the single structure for embodiment 3 with oxidation current confinement can be as follows.

-   -   Step 1. Use photolithography to mask areas which will not have P         Metal deposited.     -   Step 2. Deposit P Metal (typically TiPtAu ˜2000 A)     -   Step 3. Photolithography lifts off and wafer cleaning. O2 descum         or ash all organics off wafer.     -   Step 4. Dielectric deposit (typically SiNx ˜<1000 A) used as an         etch mask     -   Step 5. Use photolithography to mask areas of dielectric which         will not be etched.     -   Step 6. Use plasma etch to etch through dielectric (typically Fl         based etchant) can use wet etch such as BOE (buffered oxide         etch).     -   Step 7. Etch pattern into Laser or Light Emitting Diode         Epitaxial material. Stop on Substrate or doped electrical         contact layer. Typically the etch is Cl based with some (high         percentage) amount of BCl3.     -   Step 8. Clean off mask. O2 descum or ash all organics off wafer.     -   Step 9. Use photolithography to mask areas which will not have N         Metal deposited.     -   Step 10. Deposit N Metal (Typically GeAu/Ni/Au eutectic         composition of 80% Au/20% Ge by atomic weight. Total thickness         of AuGe layer ˜3000 A or more with ˜200 A Ni or more of other         diffusion barrier metal and ˜5000 A of Au or more     -   Step 11. Clean off mask (typically called lift off). O2 descum         or ash all organics off wafer.     -   Step 12. Dielectric deposit (typically SiNx ˜2000 A) used as a         non-conductive isolation barrier     -   Step 13. Use photolithography to mask areas of dielectric which         will not be etched.     -   Step 14. Use plasma etch to etch through dielectric (typically         Fl based etchant) can use wet etch such as BOE (buffered oxide         etch).     -   Step 15. Clean off mask. O2 descum or ash all organics off         wafer.     -   Step 16. Use photolithography to mask areas which will not have         Plated Metal deposited.     -   Step 17. Plate areas with ˜4-5 um of Metal (typically Au) or Cu         if diffusion barrier can be deposited first.     -   Step 18. Use photolithography to mask areas which will not have         Solder deposited.     -   Step 19. Deposit Solder Metal (Typically AuSn/Au eutectic         composition of 80% Au/20% Sn by atomic weight. Total thickness         of AuSn layer ˜40,000 A (4 microns) or more with ˜500 A Au on         top to stop any oxidation of Sn. This layer can be patterned and         deposited on the submount with electrical waveguide which is         bonded to the laser grid.     -   Step 20. Separate laser chips from wafer with cleaving or         dicing.     -   Step 21. Design and Fabricate electrical waveguide to align to         laser chip with the design to allow high frequency operation.     -   Step 22. Align and Flip Chip Bond the laser chip to the Submount         electrical waveguide

Embodiment 4 for US Pat App Pub 2017/0033535—Bottom-Emitting Oxidation

In a fourth embodiment, an oxidated single structure with multiple lasing regions is designed as a bottom-emitter rather than a top emitter. FIG. 8 through FIG. 14C provide details about Embodiment 4 and illustrate the process which can be used to make this embodiment. The lasing grid's light is emitted through the substrate forming a back emitter.

Light is transmissive in GaAs from wavelengths around 900 nm and greater. If the wavelength of the light engineered in the epitaxial design is in the range ˜900 nm and above, the GaAs substrate transmits the light or is transparent to the light. If the epitaxial design includes an N mirror that is less reflective than the P mirror, a laser such as a VCSEL can emit the light from the N mirror through the substrate. The laser beams will propagate through the material, and the substrate can be a platform for optical components to collimate, spread, diverge, converge or direct the light. This enables integrated optical circuits with extremely high bright power to be formed. The single structure and the ground contact can then be integrated to a high speed electrical waveguide substrate enabling high frequency responses from the entire grid. A ground signal ground electrical waveguide is ideal for this high speed electrical waveguide. Another type of electrical waveguide that may be used is a microstrip waveguide (see FIG. 15), where the signal pad is separated from the ground pad by a thin dielectric layer on a substrate.

FIG. 8 is an illustration of a typical epitaxial design. Any high speed design can be used for VCSEL devices. FIG. 8 shows:

-   -   81 GaAs substrate     -   82 Possible position for low resistance contact layer     -   83 N Mirror layer after contact region     -   84 Low resistance N contact region     -   85 N Mirror layer after quantum wells     -   86 Quantum Well Region     -   87 Oxidation layers     -   88 P Mirror     -   89 Low resistance P Contact layer

FIG. 9 is an illustration of the first process performed, which is P metal deposit. This is typically a Ti/Pt/Au Layer on top of the highly P doped Contact Layer forming an ohmic contact. FIG. 9 shows:

-   -   91 P Metal forming Ohmic Contact after annealing process     -   92 Low Resistance P Contact Layer

FIG. 10 is a top view of the etch of the epitaxial layer down to the N contact layer. FIG. 10 shows:

-   -   1001 Etched Area to N Contact Layer     -   1002 Single Mesa Ground Structure     -   1003 Single Mesa Active Structure     -   1004 Etch Hole to Allow Oxidation Process to form Apertures     -   1005 Area in between all holes where there will be no oxidation         which forms conductive current confinement

FIG. 10A is a cross section view A of FIG. 10 formed before oxidation process, and FIG. 10A2 is a cross section view A of FIG. 10 formed after oxidation process. FIG. 10A2 shows:

-   -   120 Oxidation completely closes off conductive path near any         etched regions that were exposed during the oxidation process.

FIG. 10B is a cross sectional view B of FIG. 10 illustrating where the current confinement apertures were formed in the areas shown. This view represents a section of the single mesa where no holes are penetrating the cross section, and clearly shows that the mesa structure is a Single Mesa Structure enabling a more robust structure preferred at the bonding process. FIG. 10B shows:

-   -   125 Current Confinement Aperture is conductive region of Single         Mesa Structure     -   126 Oxidized Layer forming as dielectric layer near where holes         where etched     -   127 P Metal Contact Layer

FIG. 11 illustrates the dielectric layer deposited and patterned with opened via “holes” for electrical contact to the epitaxial contact layers and sealing the semiconductor for reliability purposes. FIG. 11 shows:

-   -   1101 Dielectric Layer patterned with openings or “vias”     -   1102 Opening in Dielectric Layer to P Contact Metal     -   1103 Contact Layer on Single Mesa Ground Structure

FIG. 12 shows the N metal contact after it has been deposited. FIG. 12 depicts:

-   -   1201 N Contact Metal is deposited over the N Contact via hole to         make an electrical connection to the N Contact Layer.

FIG. 13 illustrates the next step of plating metal which shorts the N contact region to the top of the single grounded frame region, which will be bonded and electrically conductive to the ground pad of the GSG waveguide. The plating also adds height to the active region reducing capacitance and it removes heat from the active region of the devices to give the devices better performance. The plating over the active single structure is isolated from the N mirror and N contact region by the dielectric layer. FIG. 13 shows:

-   -   1301 Dielectric Layer preventing the Plating covering the Active         Region and extending into the holes of the single mesa structure     -   1302 Plating Covering Single Grounded Mesa Structure Shorted to         N Contact Region through N Contact Metal     -   1303 Plating Covering Active Structure and extending into the         holes of the active region where cooling can occur through a         higher thermal conductance of the plating metal     -   1304 Plated Metal extending over single frame structure for         bonding and electrically connecting to ground of GSG electrical         waveguide.

FIG. 14a illustrates solder deposited on the laser chip. This serves as the electrical conductive bonding adhesion layer between the laser chip and the high speed electrical waveguide. FIG. 14a shows:

-   -   1401 Solder deposit

FIG. 14b illustrates the alignment of the GSG electrical waveguide before bonding. FIG. 14b shows:

-   -   1403 Submount for GSG Electrical High Speed Waveguide     -   1404 Ground Pad for GSG Electrical High Speed Waveguide     -   1405 Signal Pad for GSG Electrical High Speed Waveguide     -   1406 Plating Metal Deposited on Conductive areas of GSG         Electrical High Speed Waveguide

FIG. 14C illustrates the bonded laser chip to the GSG electrical waveguide. The gap in the single grounded mesa enables high speed operation by reducing capacitance.

Embodiment 5 for US Pat App Pub 2017/0033535

In a fifth embodiment, a microstrip or strip line electrical waveguide is used rather than the GSG waveguide, as shown by FIG. 15. This embodiment can also have the gap mentioned in FIG. 14c above. This electrical waveguide can also be formed by a ground layer below a thin dielectric with a signal lead on the top of the dielectric forming a strip line or microstrip waveguide. Openings in the dielectric can be used to contact the ground portion of the lasing grid. The width of the lines and thickness of the dielectric can be controlled to produce a specific impedance value for circuit matching characteristics. It should be understood that this technique can also be used for other embodiments, such as Embodiment 2 or any of the embodiments discussed below. The view in FIG. 15 shows a cross section across the active single mesa structure:

-   -   151 Waveguide substrate     -   152 Metal Ground Pad across the entire waveguide     -   153 Dielectric layer separating the Ground from the signal pads     -   154 Metal Signal Pad     -   155 Metal Plating on Signal pad     -   156 Solder electrically connecting the signal pad to the single         active mesa shown here with gaps or holes etched into it.     -   157 Metal Plating on the Ground Pad     -   158 Solder electrically connecting the ground pad to the single         grounded mesa

Embodiment 6 for US Pat App Pub 2017/0033535

FIG. 16 shows a sixth embodiment. In FIG. 16 the structure is unique in that it leaves paths for a portion of the light of each lase point to be directed to another laser next to it in order to keep the lasing in phase. In this example the laser 161 has some of its outer mode structure reflected 162 down to the laser aperture next to it 163 which produces light in phase with 162. The laser which is in phase is 164 and in turn reflects from an angled reflective surface 165 back to the aperture of the laser next to it 167 which is also in phase with 164 and 161 and so on. An angular and or reflective area 164 just outside of the lens or output area can divert a small portion of the light which is overflowing from the lens or output diameter to the lasing grid adjacent to it, enabling a coherent lasing grid. Some of the light from the neighboring lasing points is injected into the lasing point which sets up the lasing points in a phase relation with each other. This allows a coherent operation of all lasing points when the structure directs some of the light from each laser to its neighbor. The reflectance, distance and angles are very precisely calculated by one skilled in the art of optical modeling. Coherent operation is a benefit which has eluded laser array operation for many years. FIG. 16 shows:

-   -   161 Large aperture laser with wide divergence only emitting a         portion of the light     -   162 A portion of the light from laser 161 is reflected to         aperture 163     -   163 Aperture of laser where reflectance conforms to the phase of         the light from 162     -   164 Large aperture laser with wide divergence only emitting a         portion of the light     -   165 Angled reflective surface on the back of the laser chip just         outside the output aperture     -   166 the reflected beam in phase with laser grid 164     -   167 Large aperture laser with wide divergence only emitting a         portion of the light

Embodiment 7 for US Pat App Pub 2017/0033535

FIG. 17 shows a seventh embodiment. In FIG. 17, the back side of the lasing grid chip has etched patterns to redirect the laser light 172 to particularly beneficial areas. This is accomplished by diffractive optical elements (DOE) 171, which have the surface etched in a way that when light travels through that portion, the angle of the surface and redirects 175 beams or light depending on the angle of the surface of the DOE. This can be used to collimate or diverge, direct or homogenize the light. FIG. 17 does not illustrate the electrical waveguide. The mode can be controlled by the aperture sizes and characteristics of the reflective surface 173 and 174. FIG. 17 shows:

-   -   171 Redirected Laser Grid Beam from beam 172     -   172 Laser Grid Beam emitted from apertures     -   173 Contact and back of mirror for back emitting laser grid     -   174 Contact and back of mirror for back emitting laser grid     -   175 Redirected beams from laser grid

Embodiment 8 for US Pat App Pub 2017/0033535

FIG. 18 shows an eighth embodiment. In FIG. 18, a patterned diffractive grating 184 (this is the opposite angular pattern than FIG. 17's DOE) is placed or etched over the emission points 181 on the backside of the laser wafer in a back emitting VCSEL design which directs the lasing points outward 185 from the grid. From the lens it looks like all the lasers are coming from a single point 186 behind the chip to form a virtual point source where a macro lens 187 can be used to collimate the beam from the virtual converged source behind the chip. FIG. 18 shows:

-   -   181 Contact and back of mirror for back emitting laser grid     -   182 Aperture creating laser characteristics     -   183 Laser Beam from laser grid     -   184 Surface of Diffractive Optical Element (DOE) angled for         specific total beam grid characteristics     -   185 Redirected beams from laser grid     -   186 Converged virtual light source from all beams as seen from         lens 187     -   187 macro lens with focal point on virtual convergence point 186

Embodiment 9 for US Pat App Pub 2017/0033535

FIG. 19 shows a ninth embodiment. FIG. 19 illustrates a cross section of the bonded etched and oxidized Embodiment 3, except it has microlens which have been processed on the back of the laser chip and positioned so that one is aligned to the other and one is slightly misaligned on purpose in order to redirect the laser beam emitted from the single mesa structure. While embodiment 3 is referenced for this arrangement, it should be understood that any of the above back emitting embodiments and a microlens array attached to the chip or positioned above the output grid can be used. The microlens array can have values related to the pitch of the light conducting grid points but with a slightly different pitch lens 74 forcing the light emitted by the lasing points to be directed to a single area where the beams come together or seem like they come together in front of the chip or behind the chip as in a virtual point source. If the microlens pitch is smaller than the laser pitch, it will guide the outlying lasers to a point in front of the chip or directed inward. If the microlens arrays pitch is larger than the lasers' grids' pitch, the light will be directed outward as in FIG. 19. FIG. 19 shows:

-   -   71 Laser Substrate     -   72 N Mirror     -   73 N Contact Region     -   74 MicroLens slightly offset from laser directing laser light         outward     -   75 Active region or quantum wells     -   76 Oxidized layers creating current confinement into the active         area     -   77 Etched trench creating isolation from the single ground         structure and the active single mesa structure     -   78 P Metal Contact     -   79 Hole Etched into the single mesa structure to allow oxidation         to occur     -   80 solder electrically connecting the laser chip and the High         speed electrical waveguide     -   81 Signal pad of the GSG electrical waveguide     -   82 P mirror     -   83 GSG Waveguide substrate     -   84 Plating shorting the N metal located on the N contact layer         and the single ground mesa which is in electrical contact to the         Ground Pad of the GSG electrical waveguide     -   85 Ground Pad of the GSG electrical waveguide

Embodiment 10 for US Pat App Pub 2017/0033535

FIG. 20 shows a tenth embodiment. FIG. 20 illustrates that an extended cavity laser design can be implemented using the single grid structure by reducing the reflectivity of the N epitaxial output mirror 230 to a point where it will not lase, then adding the reflectivity to a reflective surface 231 on the back of the lasing grid which extends the cavity. This structure reduces feedback of the higher mode structure 233 in the cavity, thereby forming a more fundamental mode structure for the output beam 235 from the grid. FIG. 20 shows:

-   -   230 Arrow pointing to incomplete N output mirror epitaxial         region.     -   231 Reflective region made of dielectrically layers with varying         indexes of refraction.     -   232 Cavity of laser beam now includes laser wafer material         extending the cavity for modal rejection.     -   233 Reflected higher order modes which are not reflected back         into the cavity     -   234 Single or lower order modes in the cavity     -   235 single or lower order modes outputted from the Extended         Cavity Device

Embodiment 11 for US Pat App Pub 2017/0033535

FIG. 21 shows an eleventh embodiment. In FIG. 21, a VCSEL structure can be adapted to the laser grid design like the above embodiment, and the back of the lasing chip where the output reflector (deposited on top of lens shape 241) of the lasing grid emits light can have convex 241 or concave features under the reflector to form better a focused (focus arrows 243) feedback mechanism which rejects high modes and can be designed to have a single mode lasing output 245 from each grid area. The overall lasing structure will then have low M2 values. A lens or microlens can be added to collimate the output. FIG. 21 shows:

240 Arrow pointing to incomplete N output mirror epitaxial region.

-   -   241 Reflective region made of dielectrically layers with varying         indexes of refraction deposited on top of microlens structure         etched into the laser substrate or wafer     -   242 Single mode beam being reflected within the extended cavity     -   243 light from edges being directed back into the single mode         cavity from the optical element on the surface of the chip     -   244 single mode beam has more power and is more selective of the         single mode than FIG. 20's single mode beam     -   245 Output of high quality single mode beams     -   246 highly reflective epitaxial mirror

Embodiment 12 for US Pat App Pub 2017/0033535

FIG. 22 shows a twelfth embodiment. In FIG. 22, a VCSEL structure can be adapted to the laser grid design like the above embodiment except that the beams which exit straight out of the lens go through an external microlens array which has been designed with different pitch microlens than the laser pitches to allow redirection of the beams either to or from a single location like many of the above embodiments. Other forms of this technique could use a concave lens formed on the bottom of the external lens array which are aligned and have the same pitch as the laser grid, while a convex laser array with a different pitch than the laser grid is at the top. Another technique to direct beams would be to use DOEs as the top optical element instead of the convex microlens which are on the top of the external lens array. 252 is light reflected back into the center of the aperture making a stronger single mode beam while 253 has the reflective coatings which complete the laser output mirror cavity. 254 is the cavity and would have an antireflective coating deposited on the inside of the external lens cavity while also depositing an anti-reflective coating on the top microlens array. Another technique would be to use the flat reflective properties such as in FIG. 20 to complete the cavity mirror and have the microlens array offset on the top or a DOE on top to redirect the beams. FIG. 22 shows:

-   -   250 Arrow pointing to incomplete N output mirror epitaxial         region.     -   251 Single mode beam being reflected within the extended cavity     -   252 light from edges being directed back into the center         creating strong single mode cavity from the optical element on         the surface of the chip     -   253 Reflective region made of dielectrically layers with varying         indexes of refraction deposited on top of microlens structure         etched into the laser substrate or wafer     -   254 Cavity for etched lens to not touch external lens array     -   255 External lens array transmissive material     -   256 Single Mode beam outputted by extended cavity laser     -   257 Microlens from lens array with different pitch than laser         pitch directing beams     -   258 Directed single mode beam 

What is claimed is:
 1. An apparatus for optical data communications via a line-of-sight communications link, the apparatus comprising: an optical scope, wherein the optical scope comprises (1) a camera having a camera field of view, (2) a photodetector array having a photodetector array field of view, (3) optics that define a relationship between the camera field of view and the photodetector array field of view, and (4) a processor; and a positioning system configured to controllably adjust an orientation of the optical scope to define where the optical scope is aimed based on a control signal; wherein the optics are configured to receive a flash from a remote optical data transmitter; wherein the camera is configured to generate a camera image of the flash; wherein the processor is configured to (1) spatially localize the flash in the camera image, (2) determine an adjustment needed for aligning a central region of the photodetector array field of view with the spatially localized flash, and (3) define the control signal for the positioning system based on the determined adjustment.
 2. The apparatus of claim 1 wherein the optics comprise a beam splitter that commonly bore sights the camera and the photodetector array so that the camera field of view and the photodetector array field of view are commonly centered.
 3. The apparatus of claim 1 wherein the camera and processor are configured to repeat their operations with respect to additional flashes from the remote optical data transmitter to iteratively align the optical scope with the remote optical data transmitter.
 4. The apparatus of claim 1 wherein the flash has a flash wavelength, and wherein the processor is further configured to filter the camera image to remove a plurality of wavelengths of light from the camera image other than the flash wavelength.
 5. The apparatus of claim 1 wherein the flash has a flash wavelength, and wherein the optics include an optical filter in an optical path between the optics and the camera, the optical filter adapted to remove a plurality of wavelengths of light in the optical path to the camera other than the flash wavelength.
 6. The apparatus of claim 1 wherein the positioning system is configured to controllably adjust the orientation of the optical scope based on the control signal to align the optical scope with the remote optical data transmitter; wherein the optics of the aligned optical scope are configured to (1) receive a light beam from the remote optical data transmitter, wherein the received light beam encodes data, and (2) direct the received light beam onto the photodetector array; and wherein the photodetector array is configured to convert the directed light beam into a signal representative of the data.
 7. The apparatus of claim 6 wherein the remote optical data transmitter is also configured as an optical data receiver to define a remote optical data transceiver, and wherein the optical scope further comprises a light array emitter; wherein the processor is further configured to drive the light array emitter with a flash signal to cause the light emitter array to produce a flash signal that gets directed to the remote optical data transceiver via the optics to thereby permit the optical data receiver to align itself with the light array emitter; wherein the processor is further configured to drive the light array emitter with a data signal to cause the light array emitter to produce a light beam that encodes the data signal, wherein the light beam that encodes the data signal gets directed to the optical data receiver via the optics.
 8. The apparatus of claim 1 wherein the optical scope further comprises a laser array emitter, wherein the laser array emitter comprises a laser-emitting epitaxial structure, wherein the laser-emitting epitaxial structure comprises a plurality of laser-emitting regions within a single mesa structure.
 9. A system for optical data communications via a line-of-sight communications link, the system comprising: a first optical scope, wherein the first optical scope comprises (1) a first optical scope camera having a first optical scope camera field of view, (2) a first optical scope photodetector array having a first optical scope photodetector array field of view, (3) first optical scope optics that define a relationship between the first optical scope camera field of view and the first optical scope photodetector array field of view, and (4) a first optical scope processor; and a positioning system configured to controllably adjust an orientation of the first optical scope to define where the first optical scope is aimed based on a control signal; a second optical scope, wherein the second optical scope comprises a second optical scope light emitter array; wherein the second optical scope light emitter array is configured to produce a flash that is viewable within the first optical scope camera field of view; wherein the first optical scope optics are configured to receive the flash from the second optical scope; wherein the first optical scope camera is configured to generate a camera image of the flash; wherein the first optical scope processor is configured to (1) spatially localize the flash in the camera image, (2) determine an adjustment needed for aligning a central region of the first optical scope photodetector field of view with the spatially localized flash, and (3) define the control signal for the positioning system based on the determined adjustment.
 10. The system of claim 9 wherein the first optical scope optics comprise a beam splitter that commonly bore sights the first optical scope camera and the first optical scope photodetector array so that the first optical scope camera field of view and the first optical scope photodetector array field of view are commonly centered.
 11. The system of claim 9 wherein the first optical scope camera and the first optical scope processor are configured to repeat their operations with respect to additional flashes from the second optical scope to iteratively align the first optical scope with the second optical scope.
 12. The system of claim 9 wherein the flash has a flash wavelength, and wherein the first optical scope processor is further configured to filter the camera image to remove a plurality of wavelengths of light from the camera image other than the flash wavelength.
 13. The system of claim 9 wherein the flash has a flash wavelength, and wherein the first optical scope optics include an optical filter in an optical path between the first optical scope optics and the first optical scope camera, the optical filter adapted to remove a plurality of wavelengths of light in the optical path to the first optical scope camera other than the flash wavelength.
 14. The system of claim 9 wherein the positioning system is configured to controllably adjust the orientation of the first optical scope based on the control signal to align the first optical scope with the second optical scope; wherein the first optical scope optics are configured to (1) receive a light beam from the aligned second optical scope, wherein the received light beam encodes data, and (2) direct the received light beam onto the first optical scope photodetector array; and wherein the first optical scope photodetector array is configured to convert the directed light beam into a signal representative of the data.
 15. The system of claim 14 further comprising: a second positioning system configured to controllably adjust an orientation of the second optical scope to define where the second optical scope is aimed based on a second control signal; wherein the second optical scope further comprises (1) a second optical scope camera having a second optical scope camera field of view, (2) a second optical scope photodetector array having a second optical scope photodetector array field of view, (3) second optical scope optics that define a relationship between the second optical scope camera field of view and the second optical scope photodetector array field of view, and (4) a second optical scope processor; and wherein the first optical scope further comprises a first optical scope light emitter array.
 16. The system of claim 15 wherein the first optical scope light emitter array is configured to produce a flash that is viewable within the second optical scope camera field of view; wherein the second optical scope optics are configured to receive the flash from the first optical scope; wherein the second optical scope camera is configured to generate a camera image of the flash from the first optical scope; wherein the second optical scope processor is configured to (1) spatially localize the received flash from the first optical scope, (2) determine an adjustment needed for aligning a central region of the second optical scope photodetector field of view with the spatially localized flash from the first optical scope, and (3) define the second control signal based on the determined adjustment for aligning the central region of the second optical scope photodetector field of view with the spatially localized flash from the first optical scope.
 17. The system of claim 9 wherein the second optical scope laser array emitter comprises a plurality of laser subarrays that are arranged to produce flashes that are offset from a main optical axis of the line-of-sight communication link; and wherein the second optical scope is configured to sequence through flashing of the laser subarrays to permit the first optical scope to identify a laser subarray that is aligned with the first optical scope photodetector array.
 18. The system of claim 9 wherein the second optical scope laser array emitter comprises a laser-emitting epitaxial structure, wherein the laser-emitting epitaxial structure comprises a plurality of laser-emitting regions within a single mesa structure.
 19. The system of claim 18 wherein the second optical scope laser array emitter further comprises: an electrical waveguide configured to provide a signal to the laser regions for causing the laser array emitter to selectively produce flashes and optical data beams.
 20. The system of claim 18 wherein each laser region is electrically isolated within the single mesa structure relative to the other laser regions of the single mesa structure.
 21. The system of claim 18 wherein the second optical scope laser array comprises a plurality of the laser-emitting epitaxial structures configured as a laser grid array.
 22. A method comprising: a light array emitter of a first optical scope emitting a flash toward a camera of a second optical scope, the second optical scope further comprising a photodetector array; the second optical scope camera capturing a camera image of the flash, wherein the camera image has a relationship with a field of view for the photodetector array; spatially localizing the flash in the camera image; determining an adjustment needed for aligning a central region of the photodetector array field of view with the spatially localized flash based on the relationship; and adjusting an orientation of the second optical scope based on the determined adjustment.
 23. The method of claim 22 further comprising: defining a control signal for a positioning system that controllably the second optical scope orientation based on the determined adjustment; and wherein the adjusting step comprises adjusting the orientation of the second optical scope in response to the control signal being applied to the positioning system.
 24. The method of claim 22 further comprising: repeating the method steps to achieve an alignment between the first optical scope and the second optical scope.
 25. The method of claim 22 wherein the photodetector array and the camera of the second optical scope are bore sighted so that the camera field of view and the photodetector array field of view are commonly centered.
 26. The method of claim 22 wherein the flash has a flash wavelength, the method further comprising: filtering the camera image or the incident light directed to the camera to remove a plurality of wavelengths of light from the camera image of the incident light other than the flash wavelength.
 27. The method of claim 22 further comprising: the first optical scope transmitting a light beam to the adjusted second optical scope, wherein the light beam encodes data; the photodetector array of the adjusted second optical scope receiving the light beam and converting the received light beam into a signal representative of the data.
 28. The method of claim 22 wherein the first optical scope further comprises a photodetector array and a camera, wherein the second optical scope further comprises a light emitter array, and the method further comprising: the first and second optical scopes repeating the method steps with their roles reversed so that the first optical scope is adjustably oriented based on a flash from the second optical scope.
 29. The method of claim 28 further comprising: the adjusted first and second optical scopes bi-directionally communicating data to each other via light beams emitted by their respective light emitter arrays.
 30. The method of claim 22 wherein the first optical scope laser array emitter comprises a plurality of laser subarrays that are arranged to produce flashes that are offset from a main optical axis of a line-of-sight communication link between the first and second optical scopes; and wherein the emitting step comprises the first optical scope sequencing through flashing of the laser subarrays to permit the second optical scope to identify a laser subarray that is aligned with the second optical scope photodetector array.
 31. The method of claim 22 wherein the first optical scope laser array emitter comprises a laser-emitting epitaxial structure, wherein the laser-emitting epitaxial structure comprises a plurality of laser-emitting regions within a single mesa structure.
 32. The method of claim 31 wherein the first optical scope laser array emitter further comprises an electrical waveguide configured to provide a signal to the laser regions, the method further comprising: the electrical waveguide delivering signals to the laser-emitting epitaxial structure for causing the first optical scope laser array emitter to selectively produce flashes and optical data beams.
 33. The method of claim 31 wherein each laser region is electrically isolated within the single mesa structure relative to the other laser regions of the single mesa structure.
 34. The method of claim 31 wherein the second optical scope laser array comprises a plurality of the laser-emitting epitaxial structures configured as a laser grid array.
 35. A method for aligning a line-of-sight communication link between a first optical scope and a second optical scope, the method comprising: a light array emitter of a first optical scope emitting a flash toward a camera of a second optical scope from a subarray of the light array emitter, wherein the light array emitter comprises a plurality of subarrays, and wherein the light array emitter is arranged to cause flashes produced by the subarrays to exhibit different offsets relative to a main optical axis of the line-of-sight communication link, the second optical scope further comprising a photodetector array; the second optical scope camera capturing a camera image of the flash, wherein the camera image has a relationship with a field of view for the photodetector array; spatially localizing the flash in the camera image; determining whether the subarray is aligned with a central region of the photodetector array field of view based on the spatially localized flash and the relationship; in response to a determination that the subarray is not aligned with the central region of the photodetector field of view, sequencing to another subarray of the light array emitter and repeating the emitting, capturing, spatially localizing, and determining steps with respect to the sequenced subarray until a sequenced subarray is found that is aligned with the central region of the photodetector array field of view.
 36. The method of claim 35 further comprising: the aligned subarray of the first optical scope optically communicating data to the photodetector array of the second optical scope. 